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Applied Materials Mirra Mesa CMP (Chemical Mechanical Polisher)

Asset #: 151333

Make: Applied Materials

Model: Mirra Mesa

Last Confirm Date: March 11, 2026

Applied Materials Mirra Mesa CMP (Chemical Mechanical Polisher)
- CMP Model: Mirra Mesa
- Process: OX
- Polisher System Module: 4 Head 3 Platen
Platen 1 configuration:
- Platen 1 Type: With window, belt + gear CVT
- Platen 1 endpoint: Full scan and motor torque
- Platen 1 slurry arm: Standard tunable
- Platen 1 pad conditioner arm: Standard
Platen 2 configuration:
- Platen 2 Type: With window, belt + gear CVT
- Platen 2 endpoint: Full scan
- Platen 2 slurry arm: Standard tunable
- Platen 2 pad conditioner arm: Standard
Platen 3 configuration:
- Platen 3 Type: With window, belt + gear CVT
- Platen 3 endpoint: Full scan
- Platen 3 slurry arm: Standard tunable
- Platen 3 pad conditioner arm: Standard
- Polishing head: 3 zone
- Slurry Delivery: 2 types of slurry
- Slurry Flow Rate control: Peristaltic pump
Factory Interface Options:
- FABs port: 3 Port
Facilities Options/System Safety Equipment:
- EMO Guard Ring
- Smoke Detector
Electrical Requirements:
- Line Frequency: 50/60 HZ
- Line Voltage: 200-230V
- Connection: Three-phase four-wire
- Power Lamp: Green Lamp
- Power Connected Lamp
- GFI Type: STANDARD 30mA
Cleaner Options
- Cleaner Quantity: 1 unit
- Cleaner Robot: working beam
Megasonics Module
- Cleaning Method: Vertical
- Megasonics Delivery Type: 2 Chem flow meter type
Brush 1 Module:
- Cleaning Method: Vertical
- Brush 1 clean: 1 Chem and DIW
- Brush 1 flow Type: flow meter type
Brush 2 Module
- Cleaning Method: Vertical
- Brush 2 clean: 1 Chem and DIW
- Brush 2 flow rate: flow meter type
Dry Module
- Dry Type: Spin Dryer
- Lamp heater Drying
- N2 Drying

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