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KDF 974 i Sputtering System
KDF 974 i Sputtering System
KDF 974 i Sputtering System
KDF 974 i Sputtering System

KDF 974 i Sputtering System

Asset #: 150994

Make: KDF

Model: 974 i

Last Confirm Date: March 02, 2026

KDF 974 i Sputtering System
- 3 Phase
- 208 Vac
- 50/60
- Si Doped Reactive
- 974i KDF (includes Four std. 24.4" planar cathodes)
- Water Pump CTI MDL 550
- Upgrade 10" Process Cryo To Osaka Mag-Lev - Tgkine 3304MBWB-B Turbo
- Delete Four 24.4" Planar Cathodes
- Add Three 24.4" LMM Linear Moving Magnetron Cathodes for Si Doped Reactive
- Add One 24.4" MU Inset Cathode Four Piece Cathode for Chrome
- Upgrade to Tri-Sputter with Three 10Kw Pinnacle Plus Pulse DC Capability
- Upgrade to three Reactive Gas Rings and 7 Mass Flow Meter Balance Control 6 for Tr-Sput
- Delete Moving Shutter Install Fixed Shutters
- RF Option AE Dressler 3.0Kw RF Etch
- One Spare Shield set
- Three Spare LMM DSS Dark Space Shields
- One Spare MU Dark Space Shield
- Front & Rear Haynes 242 Alloy Chain Shields two sets
- H20 Cooled Anode Plate
- H20 Cooled Chamber Plates
- Four Cool Plates For Dark Space Shields LMM & MU
- IR Substrate Temp Monitor Variable Emissivity in Recipie
- Option: Upgrade lon Gauges on Cryo & Turbo - Using MKS 909AR read only
- Light Tower
- Two Edwards iLX Dry Rough Pumps
- Cathode Removal Tool
- CE Certified & SEMI S2-0200 & NFPA 79
- Two Flat SS Pallets
2018 Vintage

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