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Perkin Elmer 4400 Sputtering System
Perkin Elmer 4400 Sputtering System
Perkin Elmer 4400 Sputtering System
Perkin Elmer 4400 Sputtering System

Perkin Elmer 4400 Sputtering System

Asset #: 149591

Make: Perkin Elmer

Model: 4400

Wafer Sizes: 6 inch

Last Confirm Date: January 26, 2026

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Perkin Elmer 4400 Sputtering System, 6"
- Load Lock
- The system has ports for four targets. Three of the target positions are currently utilized. Of those three, two are set up for DC (with RF bias capability) and one is set up for RF. I believe the fourth target position (which isn't being used) is set up for RF.
- The system is set up for planar targets with planar magnet setups.
- The system is DC and RF, with DC-RF bias capable.
- It does have the RF etch option.
- The main chamber is connected to a Cryotorr 8 cryopump with CTI SC (air-cooled) He compressor. The load lock has a Pfeiffer turbopump backed by a Trivac rotary vane pump. The system can be manually controlled to have the turbo pump evacuate the cryopump (good for faster regen and chamber maintenance time). The roughing pump for the system is an Ebara A10 roots pump. The cryopump and turbopump were rebuilt in the last year. The roughing pump has 2-3 years on it (but no issues).

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