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Ulvac NE 950 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Ulvac NE 950 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)
Ulvac NE 950 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)

Ulvac NE 950 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch)

Asset #: 138892

Make: Ulvac

Model: NE 950

Last Confirm Date: August 21, 2025

Ulvac NE 950 ICP-RIE (Inductively Coupled Plasma - Reactive lon Etch), 2" to 12"
Gas Box:
- Gas 1 Horiba STEC SEC-E40 Ar: 100SCCM
- Gas 2 Horiba STEC SEC-E40 O2: 100SCCM
- Gas 3 Horiba STEC SEC-E40 CHF3:100SCCM
- Gas 4 Horiba STEC SEC-E440J BCL3 200SCCM
- Gas 5 Horiba STEC SEC-E440J CL2 200SCCM
- Gas 6 Horiba STEC SEC-E440J SiCL4 200SCCM
- Cooling Gas: MKS 649A 50SCCM
Chamber:
- Chuck Ο† 305mmοΌˆΟ†2’ Ο†4’ Ο†6’ Ο†8’)
RF System:
- RF Generator 1: AX-1000 (AD-TEC)
- RF Generator 2: AX-1000 (AD-TEC)
- Match Box 1: AMV-1000-12.5M-CT
- Match Box 2: AMV-1000-AV3
Pressure Control:
- Valve: MKS T3PIA 26696
- MKS Valve Control
- Gauge: MKS E28D
Turbo Pump:
- Shimadzu E1-D2203MT Control Unit
- Shimadzu TMP-2203LMTG Turbo Pump
LL Chamber:
- Ο†2’ Ο†4’ Ο†6’ Ο†8’ Single Wafer Auto Transfer
- Slit Valve: SMC XGT312-50336-1A
- Pirani Gauge: Pfeiffer Vacuum TPR280
- Vaucum Gauge: Ulvac M-24
Dry Pump: Ulvac HR60
Temp Control: Risshi EXL 1106

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