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Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)
Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)

Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition)

Asset #: 135611

Make: Lam / Novellus

Model: Concept Two Sequel Express

Wafer Sizes: 8 inch

Last Confirm Date: July 01, 2025

Lam / Novellus Concept Two Sequel Express CVD (Chemical Vapor Deposition), 8"
- Wafer Type: Notch / Flat
- Process Application: SION
- Single Process Chamber
- No Integrated SMIF ASYST LPI 2200
- Not SMIF Ready
- Light Towers: 3 Colors (RYG)
- Signal Tower: Cool Station (2)
- Mag 7 Vacuum Robot
- Dual Loadlock Cassette Module
Process Chamber A:
- Process Type: SION
- RFG 5500 High Frequency Generator
- PDX 1400 Low Frequency Generator
- Gate & Throttle Valve
- Endpoint Detector: 10 /100 TORR MKS
- Nanometers Installed
- Ferrofluidic Spindle
- Clean Process: In-Situ
Sequel Gas Box:
- Gases:
C2F6 (MFC Size: 5000 sccm)
PH3 (MFC Size: 1000 sccm)
O2 (MFC Size: 5000 sccm)
SIH4 (MFC Size: 1000 sccm)
NH3 (MFC Size: 3000 sccm)
N2O (MFC Size: 10,000 sscm)
N2 (MFC Size: 5000 sccm / 10,000 sscm)
- Heater: Installed
- Shower Head: Installed
- Gas Box Exhaust: Bottom
- Gas box Facilities: Bottom
2002 Vintage

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