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Aixtron 2600 G 3 HT MOCVD Reactor (Metal Organic Chemical Vapor Deposition)
Aixtron 2600 G 3 HT MOCVD Reactor (Metal Organic Chemical Vapor Deposition)

Aixtron 2600 G 3 HT MOCVD Reactor (Metal Organic Chemical Vapor Deposition)

Asset #: 133856

Make: Aixtron

Model: 2600 G 3 HT

Wafer Sizes: 6 inch

Last Confirm Date: May 27, 2025

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Aixtron 2600 G 3 HT MOCVD Reactor (Metal Organic Chemical Vapor Deposition), 6"
- Software Version: CACE 3.5.0286
- PLC: 3.7
- SLC: 2.01
- Process: AllnGaP MOCVD Epitaxy
- Wafer: 7 x 6"
- Metal Organic Sources: TMIn x 3, TMGa x 2, TMAI x 1, Cp2Mg x 1, DIPTe x 1, CBr4 x 1
- Hydride Sources: PH 3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1
- Concentration Monitors: Episons 5 x 3 for TMIn
- Chiller Baths
- Purifiers: Entegris Getter for H2 & N2
- Filters: Entegris Filtersfor AsH3 & Ph3
- Heating System: RF Coil with Trumpf Huttinger RF Generator BIG 120/50
- Glove Box: MBraun Nitrogen Glovebox with Controller
- Custom Built Exhaust System
- Process Pump: Kashiyama SDE 300
- DOR & Glove Box Pumps: Adixen ACP - 15G x 2
- Custom Built Wet / Dry Burn Abatement System
- Reactor Chiller: Affinity Recirculating Closed Loop Chiller
- Quartz Ceiling with Temperature Control
- In-Situ Pyrometry Available
- Gas Foil Rotation (GFR): Active
- Spare Channels
- Spare Parts (potentially some available)
2002 Vintage

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