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Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher
Lam 4520 i Oxide Etcher

Lam 4520 i Oxide Etcher

Asset #: 129264

Make: Lam

Model: 4520 i

Wafer Sizes: 6 inch

Last Confirm Date: October 31, 2025

Lam 4520 i Oxide Etcher, 6"
- Bulkhead system mount w/tunnel covers
- Hine 38A open cassette Send/Receive indexers
- Software Version: Classic 7,31-42
- Oxide etcher, 6”
- Clamp type, ESC
- RF power Rack AE PDW2200 RFG1250 13,56MHz
- AE Isotropic Module
- AC Rack AC Power Distribution
- Back Helium Colling
- Main Power 208V, 3 Phase, 5Wire, 175A, 60/
- Belt driven load station
- Standard load station shuttle spatula
- Upper chamber gap drive encoder
- Dip PCB for RF power tuning
- Aluminum upper chamber electrode
- Single lower chamber endpoint detector (405/520nm) Non-heated endpoint window
- Low pressure chamber manifold
- HPS valve for chamber isolation
- AC--2 chamber pressure control
- Lower chamber RGA port
- 8 - Gas box Orbital gas box
- Gas 1: AR 375sccm
- Gas 2: CF4 100 sccm
- Gas 3: CHF3 50 sccm
- Gas 4: He 200 sccm
- Gas 5: O2 20 sccm
- Gas 6: N2 200 sccm
- Gas 7 NF3 500 sccm
- Gas 8: He 1000sccm
- UPC: He (50 sccm)
- AC input box for AC power inlet
- Trip breakers AC/DC power box

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