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STS Multiplex ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
STS Multiplex ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
STS Multiplex ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
STS Multiplex ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
STS Multiplex ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
STS Multiplex ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)

STS Multiplex ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)

Asset #: 127673

Make: STS

Model: Multiplex

Last Confirm Date: January 16, 2025

STS Multiplex ICP-DRIE (Inductively Coupled Plasma – Deep Reactive Ion Etcher)
- 400V
- 50Hz
- 3 Phase
With:
- MAG 900 CT turbopump
- Power distribution & control rack cabinet with power distribution
- Electrogrip electrostatic driver
- vAT PM-7 adaptive pressure controller
- Leybold Mag Drive 1000 pump controller
- ENI ACG-10B RF generator
- ENI ACG-3B-06 RF generator
- ENI VL-400 phase shift controller
- PowerBright VC-2000 step-up/down transformer
- BOC Edwards iQDP-80 roughing pump
- Neslab RTE-211 recirculating chiller
- Gas cabinet
- LEP300 control server
- Configured for 3in substrates
2001 Vintage

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