Heidelberg DWL 200 Laser Lithography System
Asset # :
71694
Equipment Make:
Heidelberg
Equipment Model:
DWL 200
Type:
Laser Lithography System
Wafer Size:
3", 4", 6"
Equipment Configuration:
With:
- Loading robot with an ACP CapSpin photomask processor (both Vintage 2010) for development and Cr etching of masks
- Direct writing feature
- The robotics of both machines handle 3, 4, 5 and 7-inch masks.
- Working laser is approaching 5000h (ab
- Loading robot with an ACP CapSpin photomask processor (both Vintage 2010) for development and Cr etching of masks
- Direct writing feature
- The robotics of both machines handle 3, 4, 5 and 7-inch masks.
- Working laser is approaching 5000h (ab
Equipment Video:
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Added: May 30, 2023
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Views: 169