Applied Materials Mirra 3400 CMP
Asset # :
68347
Equipment Make:
Applied Materials
Equipment Model:
Mirra 3400
Type:
Chemical Mechanical Polishing (CMP) System
Wafer Size:
Equipment Configuration:
- Software version MB60a1
- (4) Titan 200mm, three chamber carriers
- (3) 20.0” coated platens, ISRM enabled
- ISRM Endpoint software version IB11H2
- Peristaltic pumps, (2) per platen
- Nova patterned recognition unit, none
- (4) 200mm wet cassettes,
- (4) Titan 200mm, three chamber carriers
- (3) 20.0” coated platens, ISRM enabled
- ISRM Endpoint software version IB11H2
- Peristaltic pumps, (2) per platen
- Nova patterned recognition unit, none
- (4) 200mm wet cassettes,
Equipment Pictures:
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Added: December 22, 2022
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Views: 153