Nanometrics M 6100 UV L 6 Film Thickness Measurement System
Asset # :
67811
Equipment Make:
Nanometrics
Equipment Model:
M 6100 UV L 6
Type:
Film Thickness Measurement System
Wafer Size:
3", 4", 5", 6"
Equipment Configuration:
- Visible range: 400~800nm
- UV range: 210~400nm
- Objective lens for Visible : X4,10,40
- Objective lens for UV: X15
- Automatic Stage with wafer handler
- UV range: 210~400nm
- Objective lens for Visible : X4,10,40
- Objective lens for UV: X15
- Automatic Stage with wafer handler
Equipment Pictures:
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Added: October 25, 2022
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Views: 157