Applied Materials NAR 1800 Vertical In Line Sputtering Machine

Asset # : 65089
Equipment Make: Applied Materials
Equipment Model: NAR 1800
Type: Vertical In-Line Sputtering Machine
Wafer Size:
Equipment Configuration:

– Cycle Time: 40sec
– Glass Size: 730mm x 920mm
Vacuum Data:
– Entrance / exit chamber: < 2 E-02 hPa - Transfer chamber: < 5 E-06 hPa - Process chamber: < 5 E-06 hPa Productivity: - Throughput: 360 Substrates/h (four subs/carrier) - Target Utilization: > 45% ave ITO planar targets
– Substrate Dims: 730mm x 920mm x (0.4 – 1.1) mm
– Carrier Dims: approx 1700 mmL / 2100 mmH
– No masking
– Pirani vacuum meter: 10-3 hPa to 1*10-3 hPa
– Ionization gauge range: 10-2 hPa to 1*10-9 hPa
– Capacitance vacuum meter sensor head range: 10-2 hPa to 10-4 hPa
– High vacuum pump set: Turbo-molecular pump Adixen ATH1603
– Rough vacuum pumps: SP630 plus WSU 2001
– ITO cathode: DC power supply ADL 25 KW
– SiO2 cathode: Mid frequency generator 50kw
ITO Cathode:
– Type: Planar cathode
– Material of backing plate: Ti, water cooled
– Magnetic field: Move mag
– Target fixing: bonding
SiO2 Cathode:
– Type: Rotary cathode, water cooled
– Material of backing tube: stainless steel
– Magnetic field: static magnet array
– Target: sprayed onto backing tube

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  • Added: April 28, 2022

  • Views: 48

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