Picosun R 200 Atomic Layer Deposition (ALD) System

Asset # : 62095
Equipment Make: Picosun
Equipment Model: R 200
Type: Atomic Layer Deposition (ALD)
Wafer Size:
Equipment Configuration:

– 5.5 KVA
– 3 phase
– AW 208 VAC PE
– 50/60hz
Equipment Pictures:
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Picosun R 200 Atomic Layer Deposition (ALD) System 62095

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  • Added: November 10, 2021

  • Views: 54

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