Tel Alpha 8 SE Z Chemical Vapor Deposition (CVD)

Asset # : 61189
Equipment Make: Tel
Equipment Model: Alpha 8 SE Z
Type: Chemical Vapor Deposition (CVD)
Wafer Size: 8"
Equipment Configuration:

– Process: Co-SiN Low Pressure
– Wafer Shape: Notch
– Wafer Cassette: 8″ Plastic Miraial
Furnace Body:
– Heater chamber (500~1000*C)
– Furnace stand
– Water cooling piping
– Scavenger
– Cable duct
Automatic Machine Related:
– Cassette I/O port
– Cassette transfer
– Cassette stocker (2)
– Boat elevator, cap rotation
– Wafer transfer, 1+4 pitch conversion
– Pass box transfer stage
– Auto shutter, full close
Gas System:
– Gas unit: SiN
– Vacuum piping
– Temperature controller unit
– Analyzer unit: N2 L/L O2 thermometer
– N2 Purge box: half size F/Box
– MFC, MFM, FM
Control System:
– Waves
– Temperature controller: M560
– Gas flow chart panel with remote
– Man machine interface with remote
– Signal tower

Equipment Pictures:

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  • Added: September 9, 2021

  • Views: 11

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