Nikon NSR S 204 B

Asset # : 60780
Equipment Make: Nikon
Equipment Model: NSR S 204 B
Type:
Wafer Size: 8"
Equipment Configuration:

Resolution: ≤ 180 nm
– SMP Result = 165nm
Distortion: Dynamic: ≤+/-20nm (X and Y)
– X =10nm y =1nm
Mag Control Accuracy: <+/-10nm - H-I = 3.5nm - C-I = 4.0nm Max Exposure Area: - 25mm x 33mm Reticle Blinds Accuracy: .4mm to .8mm - y= 0.7 x=.65 Reticle Rotation Accuracy: IxI+3σ≤ 15nm - 3nm Illumination Power: ≥ 1000 mW/cm2 (NA/σ = 0.68/0.75) - 1257 mW/cm2 Telecentricity: ≤ 25 uRad - -0.024 uRad Illumination Uniformity: ≤1.3% (NA/σ = 0.68/0.75) - 1.03% Integrated Exposure control: +/-1.3% - -0.110% Stepping Precision: 3σ≤ 20nm - X = 10nm y = 14nm Array Orthogonality: +/-0.1sec - -0.227 urad.046 sec Alignment Accuracy: IxI+3σ ≤ 35nm (FIA) - X = 28nm Y = 21nm Focus Cal Repeatability: 3σ≤ 80nm - X = 4n Y = 5nm Wafer Loader Pre-align Repeatability: 3σ ≤ 15um - X = 2.5um Y = 2.6um T = 1.9um Focus Leveling Repeatability: 3σ≤ 80nm - Plus Scan = 13nm Minus Scan = 15nm System 100 wafer Operational Test - Cycled 100 wafer though tool with no errors

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  • Added: July 21, 2021

  • Views: 55

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