Canon FPA 5000 ES 2+ Stepper

Asset # : 58433
Equipment Make: Canon
Equipment Model: FPA 5000 ES 2 +
Type: Stepper
Wafer Size: 8" & 12"
Equipment Configuration:

– High NA covers 0.18 um to 0.15 um design rules using 248 KrF illumination
– The Platform features a reaction force receiver on both the reticle and wafer stages.
– Active dampers are added to the wafer stage to prevent machine vibrations from occurring

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  • Added: January 28, 2021

  • Views: 341

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