Karl Suss Twin Gamma 4 M Coater Developer

– 4 I/O stations, coater side, send/receive carrier for coating or developing
– 2 I/O stations developer side, deactivated and cannot be used
– I/O stations can optionally be equipped with 4 and 6 inch carriers
– Parallel operation is possible
Coater Unit
– 1 mechanical wafer alignment station (flat)
– 1 HMDS unit (bubbling system)
– 2 coater cups, spin speed 10 – 6000 rpm, acceleration 10 – 50000 rpm/s, open bowl
– 4 resist nozzles per coater cup
– Prewet /EBR nozzle
– (Solvent) nozzle for cleaning of resist nozzles
– Backside rinse
– 6 hotplates, contact, with vacuum, 60 – 250°C
– 2 coolplates, contact and with programable proximity 0.2 – 15 mm, step 0.1 mm, vacuum,
20 – 25°C
– 5 IDI pumps, low viscosity
– 3 resists, coater 1 + 2 1 resist, coater 1
– 1 resist, coater 2
– The machine is open to the top and no coater chamber / no temperature and humidity
control possible
– Robot, Genmark GB4S with needle gripper Resist cabinet
– 5 resist bottles
– 5 resist reservoirs (~500 ml)
Developer Unit
– 1 mechanical wafer alignment station (flat)
– 3 developer cups, spin speed 10 – 6000 rpm, acceleration 10 – 50000 rpm/s
– 1 (puddle) developer nozzle per developer cup
– 1 DI water nozzle per developer cup
– Backside rinse
– 6 hotplates, contact, with vacuum, 60 – 250°C
– 2 coolplates, contact and with programable proximity 0.2 – 15 mm, step 0.1 mm,
vacuum, 20 – 25°C
– Robot, Genmark GB4S with needle gripper
Temperature control devices cabinet
– 6 thermostats, Fa. Julabo Compact Refrigerated circulator F30-C 1 per coater cup and all
Resists
1 per developer cup for developer
1 for all developer cups for DI Water
– 2 thermostats, Fa. Julabo Recirculation Coolers FC600 S 1 for all coolplates
1 for flange cooling (coater + developer)
Chemical cabinet
– 2 solvent tanks, stainless steel, 10 l, change tank system
– 2 developer tanks for developer cup 1+2, polyethylene (PE), 5 l, changing tank
system
– 2 developer tanks for developer cup 3, polyethylene (PE), 5 l, changing tank
system
Used chemicals
– HMDS
– Positive i-line resists
– Solvent
– TMAH based developer with surfactant, metal free