STS / SPTS MACS ICP HR Etch System

Asset # : 57039
Equipment Make: STS / SPTS
Equipment Model: MACS
Type: ICP HR Etch System
Wafer Size: 8"
Equipment Configuration:

– Advanced Silicon Etch (ASE) with Bosch process
– HR Chamber for High Rate Etch
– Set up for 200mm wafer (150mm-200mm capable)
– MACs Loader for Cassette to Cassette operation (2 load stations)
– Carousel vacuum load lock
– Helium Backside Cooling (HBC)
– HBC Assy: ICP V2
– Clamp Type: Standard WTC
– Lower Electrode: ICP WTC Tripod Lift
– Chamber Insulation Jackets: None
Chiller: Affinity
Vacuum System:
– Turbo Pump: LEYBOLD MAG 2000
– Load Lock Pump: EBARA AA10
– Chamber Pump: EBARA A30W
Gases: C4F8(200 sccm)、SF6(1000 sccm)、O2(2000 sccm)、N2 (500 sccm)
RF Generators:
– Coil RF Power : ENI GHW-50Z 5kw
– Platen RF Power : ENI ACG-3B 13.56MHZ, 300W

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  • Added: October 9, 2020

  • Views: 305

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