Oxford PlasmaPro NGP 1000 Plasma Enhanced Chemical Vapor Deposition (PECVD)

Asset # : 56981
Equipment Make: Oxford
Equipment Model: PlasmaPro NGP 1000
Type: Plasma-Enhanced Chemical Vapor Deposition (PECVD)
Wafer Size: 8"
Equipment Configuration:

– Load Locked Chamber
– System PC, Keyboard, Mouse
– Windows 7 w/ PC4000 Software
– 490mm Diameter Aluminum Lower Electrode
– Up to 400 degrees Celcius
– Chamber Heating Kit (Heats Chamber Sidewalls to Minimize Process Deposition)
– Dual Frequency RF with Pulsing for Film Stress Control
– 600W 13.56Mhz HF RF Generator
– 600W 2Mhz LF RF Generator
– Pneumatic Chamber Lift Kit
– Adixen ADS602P Dry Pump for Process Chamber
– Adixen ACP40G for Load Lock
– Operations Manual and Documentation
– X20 External Gas Box with up to 12 Gas Lines. Currently Configured for: He / CF4 / N2 / N20 / NH3 / SiH4-N2

Equipment Pictures:

Send BTG Message:

Inquire

Ad Details

  • Added: October 9, 2020

  • Views: 202

Description

Tags :