Oxford PlasmaPro NGP 1000 ICP 380 Etcher Sold

– Load Locked Chamber
– Carrier Plate to run batches of (qty 4) 150mm wafers per run
– Carrier Plate to run batches of (qty 6) 100mm wafers per run
– System PC, Keyboard, Mouse
– Windows 7 w/ PC4000 Software
– Heated or Fluid-Cooled RIE Etch Lower Electrode w/ 3,000W, 13.56MHz RF Generator
– 490mm Diameter Aluminum Lower Electrode
– 208V ICP380 Source w/ 5kW, 2MHz RF Generator w/ Electrostatic Shield
– Dual Magnetic Spacer for improved ICP uniformity with little to no RIE Power
– Mechanical Wafer Clamping
– Optical Endpoint Detector
– Pneumatic Chamber Lift Kit
– Chamber Heating Kit
– Adixen ATH1600MT Turbo Pump
– Adixen ADP122P Dry Pump
– Adixen ACP40G Dry Pump
– Julabo FC1600 Chiller
– Operations Manual and Documentation
– X20 External Gas Box with up to 12 Gas Lines. Currently Configured for: BCL3 / N2 / CL2 / HBr / SF6 / CF4 / Ar- 02