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Oxford PlasmaPro NGP 1000 ICP 380 Etcher
Oxford PlasmaPro NGP 1000 ICP 380 Etcher
Oxford PlasmaPro NGP 1000 ICP 380 Etcher
Oxford PlasmaPro NGP 1000 ICP 380 Etcher

Oxford PlasmaPro NGP 1000 ICP 380 Etcher

Asset #: 56979

Make: Oxford

Model: PlasmaPro NGP 1000 ICP 380

Wafer Sizes: 8 inch

Oxford PlasmaPro NGP 1000 ICP 380 Etcher, 8"
- Load Locked Chamber
- Carrier Plate to run batches of (qty 4) 150mm wafers per run
- Carrier Plate to run batches of (qty 6) 100mm wafers per run
- System PC, Keyboard, Mouse
- Windows 7 w/ PC4000 Software
- Heated or Fluid-Cooled RIE Etch Lower Electrode w/ 3,000W, 13.56MHz RF Generator
- 490mm Diameter Aluminum Lower Electrode
- 208V ICP380 Source w/ 5kW, 2MHz RF Generator w/ Electrostatic Shield
- Dual Magnetic Spacer for improved ICP uniformity with little to no RIE Power
- Mechanical Wafer Clamping
- Optical Endpoint Detector
- Pneumatic Chamber Lift Kit
- Chamber Heating Kit
- Adixen ATH1600MT Turbo Pump
- Adixen ADP122P Dry Pump
- Adixen ACP40G Dry Pump
- Julabo FC1600 Chiller
- Operations Manual and Documentation
- X20 External Gas Box with up to 12 Gas Lines. Currently Configured for: BCL3 / N2 / CL2 / HBr / SF6 / CF4 / Ar- 02
2016 Vintage

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