Tel ACT 8 Photo Resist Coater

Asset # : 56390
Equipment Make: Tel
Equipment Model: ACT 8
Type: Photo Resist Coater
Wafer Size: 8"
Equipment Configuration:

– Dual Block
– 4x Coat, 4x Develop
– Right to Left Wafer Flow
– 4COT (2COT+2TCT) + 4DEV + 1IFB
– Full oven configuration with 6PHP
– Block#2 : 2ADH, 4CPL, 7LHP (5LHP on Central Stack), 4HHP, 1TRS, 1TCP, 2CWH
– Block#3 : 6PHP, 8LHP (5LHP on Central Stack), 4CPL
– Interfaced to ASML PAS5500 DUV Step/scanner
– Block#1
– Type#3 controller
– 16 RDS resist pumps
– Block#2
– 2-1 Standard COT : 4 Resist Nozzles with 4 RDS resist pumps
– 2-2 Standard COT : Same as 2-1
– 2-3 TCT (Top ARC) : 4 Resist Nozzles with 4 RDS resist pumps
– 2-4 TCT (Top ARC) : 4 Resist Nozzles with 4 RDS resist pumps
– 2ADH, 4CPL, 7LHP (5LHP on Central Stack), 4HHP, 1TRS, 1TCP, 2CWH
– Block#3
– 3-1 Develop Unit : 1 SH Nozzle
– 3-2 Develop Unit : 1 SH Nozzle- Missing parts.
1.  PRA : PRA1 Spin Motor Driver 1ea
2.  Spin Units : Spin Motor Driver 3ea and EBR Flow Meter 4ea
3.  IFB
A.   IRA X-Axis Motor Driver 1ea
B.   IRA Y-Axis Motor Driver 1ea
C.   IRA Z-Axis Motor Driver 1ea
D.   IRA Z-Axis Assembly 1ea- 3-3 Develop Unit : 1 SH Nozzle
– 3-4 Develop Unit : 1 SH Nozzle
– 6PHP, 8LHP (5LHP on Central Stack), 4CPL
– Block#4
– Interfaced to ASML PAS5500 DUV Step/scanner
– WEE
– External Chemical Supply Cabinet : 2ea
– Thermo-controller Unit : 2ea
– AC Power Unit : 1ea

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  • Added: October 9, 2020

  • Views: 346

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