Applied Materials 5500 Endura–

Asset # : 56336
Equipment Make: Applied Materials
Equipment Model: 5500 Endura
Type:
Wafer Size: 12"
Equipment Configuration:

– Wafer Shape: Flat
– 208Vac
– 50/60Hz
– 329A
– 118KVA
Chamber B:
– Type: Cooldown
– Heater / Cathode Cooling: PCW
– Clear Lid
Chamber 1 & 2:
– Type: AL PVD
– Process: AL SLAB
– Susceptor / Pedestal: HTESC
– Pump: Sumitomo KZ-8L3SL
– Heater / Cathode Cooling: Coolend
– RF Gen/DC Supply: ENI DCG200
– Gate Valve Position: 3-POS
Chamber 3 & 4:
– Type: Durasource TTN
– Process: TTN
– Susceptor / Pedestal: A101
– Pump: Sumitomo KZ-8L3SL
– Heater / Cathode Cooling: Coolend
– RF Gen/DC Supply: ENI DCG200
– Gate Valve Position: 3-POS
– Chamber 3 includes Ion Gauge Option

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  • Added: October 9, 2020

  • Views: 316

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