Applied Materials Reflexion Dielectric CMP Sold

Asset # : 56079
Equipment Make: Applied Materials
Equipment Model: Reflexion
Type: Dielectric CMP
Wafer Size: 12"
Equipment Configuration:

Platen1:
– 30” / max133rpm
– 4” pad conditioner
– DDF3type,30-120rpm / slurry line1: D4505
– max400ml/min
– tube pump
– torque end point system
Platen2:
– 30” / max133rpm
– 4” pad conditioner
– DDF3type,30-120rpm / slurry line1:D4505
– max400ml/min
– tube pump
– torque end point system
Platen3:
– 30” / max133rpm
– 4” pad conditioner
– DDF3type,30-120rpm / slurry line1:CES333
– max400ml/min
– tube pump
– slurry line2:PL-6501
– max400ml/min
– tube pump
– torque end point system
Head1:
– membrane press head
– 3zone 0-15psi
– head spindle
– max200rpm
Head2:
– membrane press head
– 3zone 0-15psi
– head spindle
– max200rpm
Head3:
– membrane press head
– 3zone 0-15psi
– head spindle
– max200rpm
Head4:
– membrane press head
– 3zone 0-15psi
– head spindle
– max200rpm
Cleaner1:
– megasonic 2roller+1idler circulating DIW flow
– 2.0l/min
– control temp
– 20-50deg
– megasonic power
– 950kHz,600w
– wafer rotation speed
– 6rpm
Cleaner2:
– 2brush 3roller+1idler
– rotation speed
– brush:max700rpm
– wafer:max50rpm
– DIW delivery
– DIW:2000ml/min
– chemical delivery
– NH4OH:2000ml/min
– brush rinse
– DIW:1000-4000ml/min
Cleaner3:
– 2brush 3roller+1idler
– rotation speed
– brush:max700rpm
– wafer:max50rpm
– DIW delivery
– DIW:2000ml/min
– chemical delivery
– FPM:2000ml/min
– brush rinse
– DIW:1000-4000ml/min
Dryer: spin rinse dryer
– max:2500rpm
– ramp heater
– 1000w infrared heater

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  • Added: October 9, 2020

  • Views: 185

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