Applied Materials Reflexion Dielectric CMP Sold

Asset # : 56079

Equipment Make: Applied Materials

Equipment Model: Reflexion

Type: Dielectric CMP

Wafer Size: 12"

Equipment Configuration:

Platen1:
– 30” / max133rpm
– 4” pad conditioner
– DDF3type,30-120rpm / slurry line1: D4505
– max400ml/min
– tube pump
– torque end point system
Platen2:
– 30” / max133rpm
– 4” pad conditioner
– DDF3type,30-120rpm / slurry line1:D4505
– max400m

Equipment Pictures: