Tel Trias Low Pressure Chemical Vapor Deposition (LPCVD)

Asset # : 44198
Equipment Make: Tel
Equipment Model: Trias
Type: Low Pressure Chemical Vapor Deposition (LPCVD)
Wafer Size: 12"
Equipment Configuration:

TI / TiN-ALD
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Ad Details

  • Added: January 25, 2019

  • Views: 152

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