Asset # : 41959
Equipment Make: Hitachi
Equipment Model: SU 70
Wafer Size:
Equipment Configuration:

Process Type: FA SEMs/TEMs/Dual Beams
– Resolution Imaging; 1 nm/15 kV, 1.6 nm/1 kV
– In-lens SE and BSE Signal Filtering and Mixing Mode
– Maximum Probe Current of 100 nA or Greater Available with the Schottky Electron Source for optional EDX, WDS, EBSP, CL and e-beam lithography

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  • Added: December 4, 2018

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