Ulvac CE 300 i RIE Machine
Asset # :
33881
Equipment Make:
Ulvac
Equipment Model:
CE 300 i
Type:
RIE Machine
Wafer Size:
3"
Equipment Configuration:
– Load Lock
– RF discharge source
– Inductive Coupled Plasma (ICP)
– RF frequency : 13.56MHz RF power
– ICP assembly upper electrode: Max 1000W
– RF biased lower electrode: Max 300W Control of discharge impedance
– Auto Purge gas: N2* Temperature contro
Equipment Pictures:
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Added: April 2, 2018
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Views: 68