Asset # : 20127
Equipment Make: KDF MRC
Equipment Model: 643 P
Type: In-Line Sputtering System
Wafer Size:
Equipment Configuration: - Three Cathode System -- Two DC Magnetron Cathodes Installed - 13" x 13" Substrate Pallet - Load Lock Heating - Process Heating - DC Bias - RF Bias - 208 V - 100.0 A - 50/60 Hz - 3 Phase
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  • Added: November 30, -0001

  • Views: 194

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