KDF MRC 643 P In Line Sputtering System
Asset # :
20127
Equipment Make:
KDF
Equipment Model:
643 P
Type:
In-Line Sputtering System
Wafer Size:
Equipment Configuration:
– Three Cathode System — Two DC Magnetron Cathodes Installed
– 13″ x 13″ Substrate Pallet
– Load Lock Heating
– Process Heating
– DC Bias
– RF Bias
– 208 V
– 100.0 A
– 50/60 Hz
– 3 Phase
Equipment Pictures:
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Added: February 14, 2019
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Views: 1023