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KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System
KDF 654 IX Sputtering System

KDF 654 IX Sputtering System

Asset #: 37819

Make: KDF

Model: 654 IX

KDF 654 IX Sputtering System
- Variable pallet, 4 target, 17” target/ Sputter
- Cathodes installed in each position: Position 1,2,4 (MU-insert target), Position 3 (Planner Magnatron)
- Target installed in each position: Position 1 (Ti), Position 2 (Ti/W 10/90), Position 3 (Ti/Al), Position 4 (Al)
- Heat in the sputter chamber, 2 locations: load lock and chamber etch station
- (QTY: 2) 5kW Advanced Energy Pinnacle Plus Power Supplies. 1 for DC Power Supply and 1 for Pulse Generator
- Etch platform installed
- 3KW Power Supply for Etch
- (QTY: 2) Cryo On Board Pumps: CTI 10 in the sputter chamber and CTI 8 F in the load lock

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