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Oxford OpAL PEALD ALD (Atomic Layer Deposition)
Oxford OpAL PEALD ALD (Atomic Layer Deposition)
Oxford OpAL PEALD ALD (Atomic Layer Deposition)
Oxford OpAL PEALD ALD (Atomic Layer Deposition)
Oxford OpAL PEALD ALD (Atomic Layer Deposition)
Oxford OpAL PEALD ALD (Atomic Layer Deposition)
Oxford OpAL PEALD ALD (Atomic Layer Deposition)

Oxford OpAL PEALD ALD (Atomic Layer Deposition)

Asset #: 62291

Make: Oxford

Model: OpAL PEALD

Last Confirm Date: November 29, 2021

Oxford OpAL PEALD ALD (Atomic Layer Deposition)
- Following gases connected: H2, NH3, O2, Ar, N2, TMA (Trimethylaluminum) was our aluminum source. We deposited only Al2O3 in this system
- Substrate holder: (240mm) resistance-heated (up to 400C)
- Remote Plasma source: 300W capacity at 13.56MHz (RF generator and automatic matching unit included)
- Metal Precursors delivery: (2) Bubbler and (2) vapor drawn
- Gas lines: Non-toxic gas lines (3 lines) and toxic gas lines (2 lines). Each gas line is equipped with its individual MFC.
- Water delivery kit included
- Ozone generator included.
- Vacuum gauges: 1000mT CM gauge + Penning
- Pumps: dry pump with precursor foreline trap fitted
- Pumping pipe work: 40mm (heating kit included)
2015 Vintage

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