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Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)
Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)

Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher)

Asset #: 55518

Make: Lam

Model: Rainbow 4520

Wafer Sizes: 6 inch

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Lam Rainbow 4520 Plasma RIE (Reactive Ion Etcher), 6"
- Etch rate (oxide)
Gases:
- Standard gas box
- Gas 1 AR
- Gas 2 CF4 or SF6
- Gas 3 CHF3
- Gas 4 HE
- Gas 5 02
- UPC HE
- Gas weldment polish
- Bottom gas panel exhaust
Wafer Transfer:
- 6" open cassette exit and entrance load lock wafer holder
- Hine 38A receiver / sender indexer
- Belt driven load station
- Standard load station shuttle spatula
AC Power:
- AC input (208V, 3Q 5w, 30A
- Fuses for AC/DC power box
- 2.2kw and 400 Khz RF power supply
Chamber Configuration:
- Envision system with CRT
- Bulkhead system mount
- Single chamber with variable gap electrode
- Automatic match system
- Electrode temperature unit interface
- Endpoint detector: monochromatic
- ESC chuck and module
- Viton O-ring all change
- Standard clean gas box installed
Pressure Control System:
- APC controller
- Throttle valve
- Isolation valve open/close type
Upper and Lower Electrode Temp Control:
- Chiller type (2080 TCU)
- Dual system
Vacuum System (option):
- Main chamber: QDP80+QMB250
Pump or IH600:
- Load lock chamber: QDP80

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