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SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer
SCIA Trim 200 Ion Beam Trimmer

SCIA Trim 200 Ion Beam Trimmer

Asset #: 157186

Make: SCIA

Model: Trim 200

Wafer Sizes: 4, 6 inch

Last Confirm Date: August 06, 2026

SCIA Trim 200 Ion Beam Trimmer, 4", 6"
- Vacuum chamber with pumps (excluding roughing pump)
- Trimming arrangement with focused ion beam source, neutralizer & 4 axis
- Wafer chuck with mechanical wafer clamping & helium backside thermal contact
- Facility supply including 3 gas channels, compressed air and cooling water distribution
- Handling robot with cassette loading, vacuum pre-aligner and wafer-ID reader
- Control rack with electricity power supply and control PC
- SECS/GEM Interface for system software
- RGA Integration
- Additional gas channel
- Handling unit upgrade to MX500 with 2 load locks
- Process chamber
- Brooks MX 400 handling robot
- Axis systems (X,Y,Z, & phi Axis)
- SECS II according to SEMI E 5-0706 standard
- GEM according to SEMI E 30-1103 standard
- Lower level protocols HSMS-SS according to SEMI E 37-0303 standard
- RGA MKS HPQ3S for process monitoring
- Software, power supply, graneville phillips micro gauge
- RGA integration for early leak detection
- Integration of MKS instruments HPQ3S IP RGA to Ion beam trimming tool process chamber and into control software
- RGA measurements active in stand-by as well as during processing
- MKS Instruments HPQ3S IP RGA including wiring
- Software controlled angle valve between process chamber and RGA to protect filament during pressure increase
- Full integration into control software
- Connection of RGA via ethernet
- Manual control of RGA to start measurement for selected masses
- Visual output of measurement
- Alarm threshold & tolerance time for 14 individual masses, averaging over defined time period possible
- Logging of up to 14 different masses in online & off-line trend
- Integration of relevant information into production log
- Automatic start of measurement with process start (when wafer is on chuck), to be switched on & off in general recipe parameters (not selectable for individual recipes)
- SECS/GEM Integration of the selected masses & current status
- 7 additional gas channel, inert, 1/4"
- 1 mass flow controller (MKS) with 2 bellow sealed pneumatically operated valves
- Gas piping in 1/4" stainless steep with VCR fittings
- Gas cabinet in system frame
- complete software & hardware integration
- Handling unit upgrade to MX 500 with 2 load locks
- Handling platform Brooks MX 500 with 2 cassette load-locks instead of MX 400 with 1 load-lock
- Wafer loading over 2 cassette load-locks in order to reduce pump down time after wafer cassette exchange
2015 Vintage

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