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Hitachi M 712 / M 711 Dry Etch Process Chamber

Asset #: 146024

Make: Hitachi

Model: M 712 / M 711

Wafer Sizes: 12 inch

Last Confirm Date: December 03, 2025

Hitachi M 712 / M 711 Dry Etch Process Chamber, 12"
- ESC Type: Bipolar
- Endpoint type: Hitachi EPD monitor ePMv02.16M
- SHIMAZU EC TMP
- 3203LMC-K1 EC TMP Controller
- DAIHEN ES7-IIA EC Source generator
- PEARL CF-500-400K EC Bias generator
- Software revision: 1.07 PMv.02.16M
Gas configuration:
Line / EC1 / Strip
- 1 / Ar
- 2 / C12
- 3 / SF6
- 4 / HBr
- 5 / CF3
- 6 / CH4
- 7 / NF3
- 8 / O2
- 9 / N2
- 10/ SF6
- 11/ C12
- 12/ O2
2006 Vintage

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