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Hitachi S 9220 CD-SEM (Critical Dimension Scanning Electron Microscope)
Hitachi S 9220 CD-SEM (Critical Dimension Scanning Electron Microscope)
Hitachi S 9220 CD-SEM (Critical Dimension Scanning Electron Microscope)
Hitachi S 9220 CD-SEM (Critical Dimension Scanning Electron Microscope)
Hitachi S 9220 CD-SEM (Critical Dimension Scanning Electron Microscope)
Hitachi S 9220 CD-SEM (Critical Dimension Scanning Electron Microscope)
Hitachi S 9220 CD-SEM (Critical Dimension Scanning Electron Microscope)
Hitachi S 9220 CD-SEM (Critical Dimension Scanning Electron Microscope)

Hitachi S 9220 CD-SEM (Critical Dimension Scanning Electron Microscope)

Asset #: 140822

Make: Hitachi

Model: S 9220

Wafer Sizes: 8 inch

Last Confirm Date: September 16, 2025

Hitachi S 9220 CD-SEM (Critical Dimension Scanning Electron Microscope), 8"
- Wafer: Notch
- Length Measurement: Cursor & Line Profile Method
- Measuring Range: 0.1 μm ~ 2.0 μm
- Throughput: Continuous measurement mode, 56 wafer / hr
- Secondary Electron Image Resolution: 3 nm (acceleration voltage 0.8 kV)
Length Measurement Reduction Accuracy:
- 4k-15k-200k times
- For magnification exceeding 150k times, the effect of electron beam irradiation shall be excluded
Image Magnification:
- Optical microscope image: Approx. 110 times
- SEM Image: 1k to 300k times
- Measurement Mode: Automatic Measurement, Manual Measurement
Stage:
- Range of Movement: X-axis: 0-200 mm, Y-axis: 0-200 mm
- Drive System: Pulse Motor Drive
- Control: Computer Control, Positioning control by linear encoder
- Drive Speed: Max. 100 mm / sec (each X-axis & Y-axis)
Loader System:
- Wafer Carrier -> Loader Room: Automatic Transfer by Wafer Transfer Robot
- Between Loader Room & Stage: Automatic Vacuum Exhaust, Automatic Loading
Wafer Transfer Robot:
- Method: Random access type for 2 cassettes
- Wafer Detection in Cassette: Wafer Searcher Built in
- Chucking Method: Vacuum Suction on the back side of the wafer
- OF, V-notch Detection: Automatic Detection by Optical Sensor
Electron Optics:
- Acceleration Voltage: 500 to 1600 V (variable in 10 V steps)
- Lens System: Electromagnetic Lens System, Booster Stock Lens
- Detection System: Scintillator / Photomultiplier Detector using EXB Filter
- Two-stage detection method for SE and BSE images
- Objective Lens Diaphragm: Heated thin film movable pattern (4 hole switching from outside the vacuum) with fine adjustment mechanism
- Scanning Coil: 2-stage Electromagnetic Deflection
- Astigmatism Correction: 8-pole Electromagnetic System (X,Y)
- Prove Current Monitor: Built-in Faraday Cup, with automatic measurement function
- Optical Microscope: Approx. 1.2 mm square field of view, with black & white CCD camera
Control / Display System:
- Observation & Control CRT: EWS (GUI) 21 inch CRT
- Combined use of SEM image / optical image display & computer dialogue operation
- Display measurement conditions, wafer map, length measurement value, stage coordinates
- Scanning Mode: TV Scan, with auto brightness / contrast function
- Image Processing: Software using filtering
- Real time image processing (optional) using DSP
- Image Recording: Optional video printing device & image file save function
- Safety Device: With emergency shutoff (mushroom type)
Length Measurement Data Processing:
- File Saving Function: Various measurement condition file save function
- Storage Medium: 9G byte hard disk (including for system programs)
- Auxiliary Storage medium: 3.5 inch magento-optical disk driver, 3,5 inch F / D River
- Data Embedding Function: Statistical calculation function using worksheets (mean value, standard deviation, etc.)
- Real time length measurement value graph display function
- Print Output: 80 digit thermal printer
Vacuum Exhaust System:
- Method: Fully automatic dry clean exhaust system
- Vacuum pump: 3 ion pumps, two turbo molecular pumps, 2 dry pumps (supplied)
Safety Function:
- Protection function in the event of a power outrage
- Air pressure drop
- Cooling water flow rate drop (self) with dynamic valve closing function
- Pump stop function

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